Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation
نویسندگان
چکیده
Printer for Local Area Activation Alfredo Mameli,*,† Yinghuan Kuang,† Morteza Aghaee,† Chaitanya K. Ande,† Bora Karasulu,† Mariadriana Creatore,† Adriaan J. M. Mackus,† Wilhelmus M. M. Kessels,† and Fred Roozeboom†,‡ †Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands ‡Department Thin Film Technology, TNO, High Tech Campus 21, 5656 AE Eindhoven, The Netherlands
منابع مشابه
Indium-tris-guanidinates: a promising class of precursors for water assisted atomic layer deposition of In2O3 thin films.
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عنوان ژورنال:
دوره 29 شماره
صفحات -
تاریخ انتشار 2017